Nanoscribe’s 150 × 150 mm² stage, now standard on Quantum X systems, enables wafer-scale manufacturing with a print area nine times larger than previous configurations. It supports high-precision fabrication of micro-optics on substrates and wafers up to 8 inches, providing the foundation for wafer-scale optical packaging, alignment, and assembly workflows.

For optical communications and photonic integration, the large-area capability enables direct fabrication of micro-optics on photonic wafers and individual dies, including optical coupling structures and beam-shaping elements for optical interconnects and emerging co-packaged optics architectures. Combined with aligned 3D printing and Two-Photon Grayscale Lithography (2GL®), the large stage boosts throughput while maintaining submicron precision.

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