High Precision Selective Laser Cleaning for Silicon Photonics

Stand C1126

17th September 2025


Femtum has introduced an advanced dry laser cleaning solution specifically designed for semiconductor manufacturing, enabling precise removal of residues, epoxy, and organic contaminants from both wafers and dies. Utilizing a non-contact, solvent-free approach, this technology selectively eliminates unwanted materials, ensuring only contaminants are affected while leaving the underlying structures untouched. Easily integrable into current fabrication lines and advanced packaging workflows, this solution not only improves process yield but also reduces the risk of defects and rework.

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